松本 茂野, DIÑO Wilson A. T., DAVID Melanie Y., MUHIDA Rifki, ROMAN Tanglaw A., 国方 伸一, 高野 史好, 秋永 広幸, 笠井 秀明
真空
50
(6),
437-439,
2007
We propose an intricate method of Reactive Ion Etching (RIE) process design for transition-metal (TM) materials using <i>ab-initio</i> calculations.<br> The TM materials are inert in dry etching …
DOI
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