Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang, Kwang Duk Na, Cheol Seong Hwang, Gee-Man Kim, Kang Jun Choi, Jae Hak Jeong
Applied Physics Letters
92
(20),
202902-,
2008-05-19
<jats:p>This study examined the interfacial reaction of plasma-enhanced atomic layer deposited TaCxNy films with underlying SiO2 and HfO2 layers, as well as their effective work functions (EWFs). …
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