Novel Concurrent Formation of Mo–Si and Si–C Bonds by the Reaction between [MoH<SUB>4</SUB>(Ph<SUB>2</SUB>PCH<SUB>2</SUB>CH<SUB>2</SUB>PPh<SUB>2</SUB>)<SUB>2</SUB>] and PhSiH<SUB>3</SUB>

• Zhou Da-Yang

  Department of Materials Chemistry, Faculty of Engineering, Yokohama National University

• Minato Makoto

  Department of Materials Chemistry, Faculty of Engineering, Yokohama National University

• Ito Takashi

  Department of Materials Chemistry, Faculty of Engineering, Yokohama National University

• Yamasaki Mikio

  Rigaku Corporation

Bibliographic Information

Other Title

• Novel Concurrent Formation of Mo–Si and Si–C Bonds by the Reaction between [MoH4(Ph2PCH2CH2PPh2)2] and PhSiH3

Abstract

Reaction of [MoH₄(Ph₂PCH₂CH₂PPh₂)₂] with PhSiH₃ in refluxing toluene yielded doubly chelated novel complexes with the Si–C–C–P–Mo framework as a result of the oxidative addition involving Si–H bond cleavage concurrent with the selective activation of the ortho C–H bonds of the dppe ligands.

Journal

• Chemistry Letters

  Chemistry Letters 26 (10), 1017-1018, 1997

  The Chemical Society of Japan

Keywords

• General Chemistry

Details

• CRID: 1390282679551445504
• NII Article ID: 10002615759
• NII Book ID: AA00603318
• DOI: 10.1246/cl.1997.1017
• COI: 1:CAS:528:DyaK2sXms1egsro%3D
• ISSN: 13480715
• ISSN: 03667022
• Web Site: https://academic.oup.com/chemlett/article-pdf/26/10/1017/56074069/cl.1997.1017.pdf
• Text Lang: en
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed