A Positive-Working Alkaline Developable Photoresist Based on t-Boc-Calix[4]resorcinarene and a Photoacid Generator

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  • Kazumasa Takeshi
    Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University
  • Ryuji Nakayama
    Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University
  • Mitsuru Ueda
    Department of Human Sensing and Functional Sensor Engineering, Graduate School of Engineering, Yamagata University

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Abstract

<jats:title>Abstract</jats:title> <jats:p>A positive working photoresist based on octa-O-tert-butyl carbonated C-hexylcalix[4]resorcinarene (t-BOC-h-C4) and p-nitrobenzyl-9,10-dimethoxy-anthracene-2-sulfonate (NDS) as a photoacid generator has been developed. The photoresist consisting of t-BOC-h-C4 (90 wt%) and NDS (10 wt%) showed a sensitivity of 24 mJ/cm2 and a contrast of 8.1, when it was exposed to 365 nm light and postbaked at 90°C for 2 min, followed by developing with a 1% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature.</jats:p>

Journal

  • Chemistry Letters

    Chemistry Letters 27 (9), 865-866, 1998-09-01

    Oxford University Press (OUP)

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