Studies on heteroepitaxial growth of GaAs on Si substrate by metal organic chemical vapor deposition 有機金属気相成長法によるSi基板上GaAs成長の研究
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著者
書誌事項
- タイトル
-
Studies on heteroepitaxial growth of GaAs on Si substrate by metal organic chemical vapor deposition
- タイトル別名
-
有機金属気相成長法によるSi基板上GaAs成長の研究
- 著者名
-
藤田, 和久
- 著者別名
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フジタ, カズヒサ
- 学位授与大学
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名古屋工業大学
- 取得学位
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工学博士
- 学位授与番号
-
乙第40号
- 学位授与年月日
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1992-06-04
注記・抄録
博士論文
目次
- CONTENTS / (0003.jp2)
- Chapter 1.Introduction / p1 (0005.jp2)
- 1.1 Background / p1 (0005.jp2)
- 1.2 GaAs epitaxial growth on Si / p4 (0007.jp2)
- 1.3 Initial stage of GaAs growth on Si / p10 (0010.jp2)
- 1.4 Purpose and organization of dissertation / p15 (0012.jp2)
- References / p19 (0014.jp2)
- Chapter 2.Si substrate preparation for GaAs growth on Si / p27 (0018.jp2)
- 2.1 Introduction / p27 (0018.jp2)
- 2.2 Experimental procedure / p29 (0019.jp2)
- 2.3 Domain direction of GaAs layers / p33 (0021.jp2)
- 2.4 Surface morphology and crystallinity of GaAs layers / p44 (0027.jp2)
- 2.5 Conclusions / p48 (0029.jp2)
- References / p53 (0031.jp2)
- Chapter 3.AsH₃ preflow conditions for GaAs growth on Si / p54 (0032.jp2)
- 3.1 Introduction / p54 (0032.jp2)
- 3.2 Experimental procedure / p55 (0032.jp2)
- 3.3 Structural quality of GaAs layers / p57 (0033.jp2)
- 3.4 Interface structure of GaAs/Si / p62 (0036.jp2)
- 3.5 Conclusions / p64 (0037.jp2)
- References / p65 (0037.jp2)
- Chapter 4.Initial stage of GaAs growth on Si / p67 (0038.jp2)
- 4.1 Introduction / p67 (0038.jp2)
- 4.2 Experimental procedure / p69 (0039.jp2)
- 4.3 Si surface after AsH₃ preflow / p70 (0040.jp2)
- 4.4 GaAs initial layers on Si / p77 (0043.jp2)
- 4.5 Conclusions / p86 (0048.jp2)
- References / p87 (0048.jp2)
- Chapter 5.GaAs growth on Si using an (Al,In) GaAs/GaAs buffer layer / p89 (0049.jp2)
- 5.1 Introduction / p89 (0049.jp2)
- 5.2 Experimental procedure / p91 (0050.jp2)
- 5.3 Crystalline quality of GaAs layers / p94 (0052.jp2)
- 5.4 Initial stage of GaAs growth on Si / p99 (0054.jp2)
- 5.5 Conclusions / p109 (0059.jp2)
- References / p110 (0060.jp2)
- Chapter 6.GaAs growth on Si by alternate gas flow of the source materials / p113 (0061.jp2)
- 6.1 Introduction / p113 (0061.jp2)
- 6.2 Experimental procedure / p114 (0062.jp2)
- 6.3 Low temperature growth of GaAs on Si / p117 (0063.jp2)
- 6.4 Application to GaAs buffer layer / p129 (0069.jp2)
- 6.5 Conclusions / p131 (0070.jp2)
- References / p134 (0072.jp2)
- Chapter 7.Summary / p137 (0073.jp2)
- Scope of future work / p140 (0075.jp2)
- Acknowledgments / p143 (0076.jp2)
- List of related publications / p145 (0077.jp2)