Materials for microlithography : radiation-sensitive polymers

Author(s)

• Thompson, L. F.
• Willson, C. G. (C. Grant)
• Fréchet, J. M. J.
• American Chemical Society. Division of Polymeric Materials : Science and Engineering
• American Chemical Society. Division of Polymer Chemistry
• American Chemical Society. Meeting (187th : 1984 : St. Louis, Mo.)

Bibliographic Information

Materials for microlithography : radiation-sensitive polymers

L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984

（ACS symposium series, 266）

The Society, 1984

Other Title

Radiation-sensitive polymers

Note

Includes bibliographies and indexes

Details

• NCID: BA03230678
• ISBN:
  • 0841208719
• LCCN: 84021744
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Washington, D.C.
• Pages/Volumes: viii, 494 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.15.P6
  • DC19 : 621.381/73
• Subject Headings:
  • LCSH : Polymers and polymerization -- Congresses
  • LCSH : Photoresists -- Congresses
  • LCSH : Microlithography -- Materials -- Congresses
  • LCSH : Microelectronics -- Materials -- Congresses
• Parent Bibliography ID:
  • BA00073096