Ionized-cluster beam deposition and epitaxy

著者

• 高木, 俊宜 タカギ, トシノリ

書誌事項

Ionized-cluster beam deposition and epitaxy

by Toshinori Takagi

（Materials science and process technology series）

Noyes Publications, c1988

注記

Bibliography: p. 218-228

Includes index

内容説明・目次

内容説明

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented in a single volume to give a coherent presentation to all those interested or working in the field. ICB processes are well characterized and reliable equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.

目次

Introduction to Ionized-Cluster BeamsThe Ionized-Cluster Beam Deposition SystemFormation and Characteristics of ClustersFilm Formation MechanismsProperties of ICB-Deposited FilmsICB and Sputter DepositionConclusionReferencesIndex

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA06829865
• ISBN:
  • 081551168X
• LCCN: 88017884
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Park Ridge, N.J., U.S.A.
• ページ数/冊数: viii, 231 p.
• 大きさ: 26 cm
• 分類:
  • LCC : TK7872.T55
  • DC19 : 621.381/7
• 件名:
  • LCSH : Thin film devices -- Design and construction
  • LCSH : Epitaxy
• 親書誌ID:
  • BA04523161