Ionized-cluster beam deposition and epitaxy

Author(s)

• 高木, 俊宜 タカギ, トシノリ

Bibliographic Information

Ionized-cluster beam deposition and epitaxy

by Toshinori Takagi

（Materials science and process technology series）

Noyes Publications, c1988

Note

Bibliography: p. 218-228

Includes index

Details

• NCID: BA06829865
• ISBN:
  • 081551168X
• LCCN: 88017884
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Park Ridge, N.J., U.S.A.
• Pages/Volumes: viii, 231 p.
• Size: 26 cm
• Classification:
  • LCC : TK7872.T55
  • DC19 : 621.381/7
• Subject Headings:
  • LCSH : Thin film devices -- Design and construction
  • LCSH : Epitaxy
• Parent Bibliography ID:
  • BA04523161