書誌事項

Surface analysis and interactions

edited by Orlando Auciello, Daniel L. Flamm

(Plasma-materials interactions, . Plasma diagnostics ; v. 2)

Academic Press, c1989

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注記

Includes bibliographies and index

内容説明・目次

内容説明

Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject. short version, TJE_ Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject.

目次

OF VOLUME 2: J.W. Coburn, Quartz Crystal Microbalances for Studies of Plasma-Surface Interactions. D.L. Smith, H.P. Gillis, and T.M. Mayer, Elemental Analysis of Treated Surfaces. D.E. Aspnes and R.P.H. Chang, Spectroscopic Ellipsometry in Plasma Processing. B.L. Doyle and W.-K. Chu, Ion Beam Analysis of Plasma-Exposed Surfaces. P.C. Stangeby, The Interpretation of Plasma Probes for Fusion Experiments. B.K. Bein and J. Pelzl, Analysis of Surfaces Exposed to Plasmas by Non-Destructive Photoacoustic and Photothermal Techniques.

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