Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California

著者

• MacDonald, Scott A.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Advances in resist technology and processing V : 29 February-2 March, 1988, Santa Clara, California

Scott A. MacDonald, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 920）

International Society for Optical Engineering, 1988

• pbk.

注記

Includes bibliographies and index

詳細情報

• NII書誌ID(NCID): BA07915350
• ISBN:
  • 0892529555
• LCCN: 88060780
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: viii, 449 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC19 : 686.2/325
• 件名:
  • LCSH : Photoresists -- Congresses
• 親書誌ID:
  • BA0022700X