Semiconductor material and device characterization
著者
書誌事項
Semiconductor material and device characterization
Wiley, c1990
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注記
"A Wiley-Interscience publication."
Includes bibliographical references and index
内容説明・目次
内容説明
This detailed sourcebook provides an up-to-date description and unified treatment of the characterization techniques used in the semiconductor industry. It covers electrical, optical, electron- beam, ion-beam, X-ray and gamma ray methods. This information, until now scattered in journals and review papers, is presented in a unified manner with over 1300 references. It is also a valuable reference book on characterization methods.
目次
- Resistivity
- Carrier and Doping Concentration
- Contact Resistance and Schottky Barrier Height
- Series Resistance, Channel Length, Threshold Voltage
- Mobility
- Oxide and Interface Trapped Charge
- Deep-Level Impurities
- Carrier Lifetime
- Optical Characterization
- Chemical and Physical Characterization
- Appendixes
- Index.
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