Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.

Author(s)

• Lucovsky, G.
• Ibbotson, Dale E.
• Hess, Dennis W.

Bibliographic Information

Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.

editors, Gerald Lucovsky, Dale E. Ibbotson, Dennis W. Hess

（Materials Research Society symposium proceedings, v. 165）

Materials Research Society, c1990

Note

Includes bibliographical references and index

Details

• NCID: BA11202521
• ISBN:
  • 1558990534
• LCCN: 90006543
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pittsburgh, Pa.
• Pages/Volumes: ix, 250 p.
• Size: 24 cm
• Classification:
  • LCC : TS695.15
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Plasma-enhanced chemical vapor deposition -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
• Parent Bibliography ID:
  • BA00013775