Ion implantation in semiconductors and other materials : [proceedings]

著者

• International Conference on Ion Implantation in Semiconductors and Other Materials, 3d, Yorktown Heights, N.Y., 1972
• Crowder, Billy L.

書誌事項

Ion implantation in semiconductors and other materials : [proceedings]

edited by Billy L. Crowder

（The IBM research symposia series）

Plenum Press, [1973]

注記

Includes bibliographical references

収録内容

• Radiation damage in metals and semiconductors / W. Frank
• The depth distribution of phoshorus ions implanted into silicon crystals / P. Blood, G. Dearnaley, and M.A. Wilkins
• Theory of the spatial distribution of ion range energy deposition / D.K. Brice

• NII書誌ID(NCID): BA11291601
• ISBN:
  • 0306307561
• LCCN: 73014789
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: New York
• ページ数/冊数: xii, 657 p.
• 大きさ: 26 cm
• 分類:
  • LCC : TK7871.85
  • DC : 537.6/22
• 件名:
  • LCSH : Ion implantation -- Congresses
  • LCSH : Semiconductors -- Congresses
• 親書誌ID:
  • BA01477192