Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

著者

• Yanof, Arnold W.
• Society of Photo-optical Instrumentation Engineers
• SPIE Symposium on Microlithography

書誌事項

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1089）

SPIE, c1989

注記

Proceedings of the SPIE Symposium on Microlithography

Includes bibliographical references

詳細情報

• NII書誌ID(NCID): BA12683130
• ISBN:
  • 0819401242
• LCCN: 89060655
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: viii, 388 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.381/52
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X