Characteristics of sputtered particles, technical applications
著者
書誌事項
Characteristics of sputtered particles, technical applications
（Topics in applied physics, v. 64 . Sputtering by particle bombardment / edited by R. Bhrisch and K. Wittmaack ; 3）
Springer-Verlag, c1991
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- : us
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注記
Includes bibliographical references and indexes
内容説明・目次
内容説明
Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described include surface and depth analysis, micromachining, and the production of surface coatings and thin films. This textbook on surface physics, materials science and semiconductor technology is intended for researchers in universities and industrial laboratories and also engineers.
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