Laser ablation of electronic materials : basic mechanisms and applications
著者
書誌事項
Laser ablation of electronic materials : basic mechanisms and applications
(European Materials Research Society monographs, v. 4)
North-Holland, 1992
- : alk. paper
大学図書館所蔵 件 / 全7件
-
該当する所蔵館はありません
- すべての絞り込み条件を解除する
注記
Proceedings of the 1991 Summer School on Laser Ablation of Electronic Materials, held in Gironde, France, Sept. 16-19, 1991
Includes bibliographical references and index
内容説明・目次
内容説明
The contributions in this volume focus on the main directions that ablation has taken in recent years: basic mechanisms, diagnostics and applications to surface etching, materials synthesis and instrumentation. T he materials synthesis of new compounds is expanding rapidly since the discovery of high Tc superconductors. Photoablation has developed into a very elegant technique to evaporate solids and grow thin films and multilayers in a very controlled manner. Mass and optical spectroscopies of ablated particles have led to new concepts of fast analysis of solids, which are certainly going to be widely used and further developed. New experimental as well as theoretical approaches are presented. The work will be the definitive reference source for anyone interested in the latest advances and results of current experimental research in ablation techniques and concepts.
目次
- Historical Overview. First ages of the coherent electromagnetic waves generation applied to new materials transfer processes named laser ablation (J.-F. Eloy). I. Mechanisms, Spectroscopy and Diagnostics. Electron emission by laser irradiated surfaces (G. Petite et al.). Laser-ablation: Fundamentals and recent developments (D. Bauerle et al.). Laser ablation of solids: Basic principles and physical effects (M. von Allmen). Comparison of the ablation of dielectrics and metals at high and low laser powers (R.W. Dreyfus). Effects of ambient background gases on YBCO plume propagation under film growth conditions: Spectroscopic, ion probe, and fast photographic studies (D.B. Geohegan). Picosecond laser ablation of mono and multicomponent targets (W. Marine et al.). Laser ablation dynamics of superconductors: Photoacoustic and spectroscopic studies (P.E. Dyer et al.). Creation mechanism of a laser-plasma in front of a solid in an ambient gas (C. Boulmer-Leborgne et al.). Dynamics of laser ablation of high Tc superconductors and semiconductors and a new method for growth of films (K. Murakami). Plasma formation from laser-target interaction
- Basic phenomena and applications to superconducting thin film deposition (C. Champeaux et al.). Analytical tools using laser ablation (J.F. Muller et al.). II. Laser Ablation and Etching. Ultraviolet laser interactions with polymer surfaces in the microsecond regime: The photokinetic effect (R. Srinivasan). Surface modification of polymers with excimer lasers and its applications (A. Yabe, H. Niino). 248 nm laser ablation of chlorinated copper and CuCl surfaces (S. Kuper et al.). Surface modification of polymers and ceramics induced by excimer laser radiation (D.W. Thomas et al.). Polishing of diamond films by light (V.N. Tokarev et al.). Laser ablation and laser etching (J. Boulmer et al.). Excimer laser projector for materials processing applications (M.C. Gower, P.T. Rumsby). III. Thin Film Deposition and Materials Synthesis. Laser ablation synthesis and properties of epitaxial superconducting superlattices (D.H. Lowndes et al.). In-situ preparation of High thin films by pulsed laser deposition (H.-U. Habermeier). Laser ablation of BiSrCaCuO films (J. Perriere). Characterization of thin films of superconducting BiSrCaCuO and YBaCuO produced by laser ablation and spectroscopic analysis of intermediate species (A. Giardini Guidoni et al.). Growth of YBCO superconducting thin films (D. Chambonnet et al.). The unique applications of pulsed laser deposition to the epitaxial growth of semiconductor films (J.T. Cheung, H. Sankur). Laser ablation for the synthesis of oxides (F. Beech et al.). Influence of ambient gas and substrate temperature in preparation of silicon dioxide films by laser ablation (A. Slaoui et al.).
「Nielsen BookData」 より