Silicon-on-insulator : its technology and applications

Author(s)

• 古川, 静二郎 フルカワ, セイジロウ
• US-Japan Seminar on "Solid Phase Epitaxy and Interface Kinetics"
• National Science Foundation (U.S.)
• 日本学術振興会 ニホン ガクジュツ シンコウカイ

Bibliographic Information

Silicon-on-insulator : its technology and applications

edited by S. Furukawa

KTK Scientific Publishers , D. Reidel , Sold and distributed in the U.S.A. and Canada by Kluwer Academic Publishers, 1985

Uniform Title

Layered structures and interface kinetics

Note

"Papers presented during the US-Japan Seminar on 'Solid Phase Epitaxy and Interface Kinetics' held in Oiso, Japan, June 20-24, 1983 ... co-sponsored by National Science Foundation and Japan Society for the Promotion of Science"--P. 5

Companion volume containing the other papers presented at seminar published under title: Layered structures and interface kinetics

"ASST, advances in solid state technology"--Cover

Includes bibliographical references and index

Details

• NCID: BA21045157
• ISBN:
  • 9027719403
• LCCN: 84027751
• Country Code: ja
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Tokyo,Boston,Hingham, MA
• Pages/Volumes: viii, 295 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.85
  • DC19 : 621.381
• Subject Headings:
  • LCSH : Solid state electronics -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Silicon -- Congresses
  • LCSH : Epitaxy -- Congresses
  • LCSH : Silicon-on-insulator technology