Handbook of semiconductor wafer cleaning technology : science, technology, and applications
Author(s)
Bibliographic Information
Handbook of semiconductor wafer cleaning technology : science, technology, and applications
Noyes Publications, c1993
Available at 5 libraries
  Aomori
  Iwate
  Miyagi
  Akita
  Yamagata
  Fukushima
  Ibaraki
  Tochigi
  Gunma
  Saitama
  Chiba
  Tokyo
  Kanagawa
  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
  Shizuoka
  Aichi
  Mie
  Shiga
  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
  China
  Thailand
  United Kingdom
  Germany
  Switzerland
  France
  Belgium
  Netherlands
  Sweden
  Norway
  United States of America
Note
Includes bibliographical references and index
Description and Table of Contents
Description
This book brings together into one volume all pertinent knowledge on semiconductor wafer cleaning and the scientific and technical disciplines associated directly or indirectly with this subject. The book provides the first comprehensive and up-to-date co
Table of Contents
Overview and Evolution of Semiconductor Wafer Contamination and Cleaning TechnologyTrace Chemical Contamination on Silicon SurfacesAqueous Cleaning ProcessesParticle Deposition and AdhesionOverview of Dry Wafer Cleaning ProcessesU
by "Nielsen BookData"