Bibliographic Information

Oxidation, diffusion and epitaxy

ed. by R.M. Burger and R.P. Donovan

(Solid state physical electronics series, . Fundamentals of silicon integrated device technology ; v. 1)(Prentice-Hall electrical engineering series)

Prentice-Hall, c1967

Available at  / 22 libraries

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Details

  • NCID
    BA22478295
  • LCCN
    67013671
  • Country Code
    us
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Englewood Cliffs, N.J.
  • Pages/Volumes
    xiv, 495 p.
  • Size
    24 cm
  • Parent Bibliography ID
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