Characterization in silicon processing
著者
書誌事項
Characterization in silicon processing
（Materials characterization series）
Butterworth-Heinemann , Manning, c1993
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
This volume is devoted to consideration of the use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. Each chapter treats a type of film used in silicon devices and discusses typical problems seen throughout that film's history, including characterization tools which are most effectively used in clarifying and solving those problems.
目次
- Application of Materials Characterization Techniques to Silicon Epitaxial Growth
- Polysilicon Conductors
- Silicides
- Aluminum and/or Copper Conductors
- Tungsten Based Conductors
- Diffusion Barriers.
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