Semiconductor microlithography V

著者

• Dey, Jim
• Society of Photo-optical Instrumentation Engineers
• Northern California Microphotomask/Masking Working Group
• International Society for Hybrid Microelectronics

書誌事項

Semiconductor microlithography V

Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid Microelectronics

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 221）

S.P.I.E.-- Society of Photo-optical Instrumentation Engineers, c1980

• pbk.

注記

March 17-18, 1980, San Jose, California

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA23910959
• ISBN:
  • 089252250X
• LCCN: 80050727
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: viii, 204 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC19 : 621.381/71
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0118856X