Dey, Jim

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  • Semiconductor microlithography VI, March 30-31, 1981, San Jose, California

    Jim Dey

    SPIE, the International Society for Optical Engineering c1981 Proceedings / SPIE -- the International Society for Optical Engineering v. 275

    所蔵館1館

  • Semiconductor microlithography V

    Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid Microelectronics

    S.P.I.E.-- Society of Photo-optical Instrumentation Engineers c1980 Proceedings of the Society of Photo-Optical Instrumentation Engineers v. 221

    pbk.

    所蔵館3館

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