Semiconductor microlithography V

Author(s)

• Dey, Jim
• Society of Photo-optical Instrumentation Engineers
• Northern California Microphotomask/Masking Working Group
• International Society for Hybrid Microelectronics

Bibliographic Information

Semiconductor microlithography V

Jim Dey, editor ; presented by the Society of Photo-optical Instrumentation Engineers in cooperation with the Northern California Microphotomask/Masking Working Group and the International Society for Hybrid Microelectronics

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 221）

S.P.I.E.-- Society of Photo-optical Instrumentation Engineers, c1980

• pbk.

Note

March 17-18, 1980, San Jose, California

Includes bibliographical references and indexes

Details

• NCID: BA23910959
• ISBN:
  • 089252250X
• LCCN: 80050727
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: viii, 204 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC19 : 621.381/71
• Subject Headings:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0118856X