Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

Author(s)

• Blais, Phillip D.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 393）

SPIE, c1983

• pbk.

Note

Includes bibliographical references and index

Details

• NCID: BA23970906
• ISBN:
  • 0892524286
• LCCN: 83061531
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: viii, 242 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC19 : 621.3815/2
• Subject Headings:
  • LCSH : Lithography, Electron beam
  • LCSH : X-ray lithography
  • LCSH : Ion beam lithography
• Parent Bibliography ID:
  • BA0022700X