Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

著者

• Blais, Phillip D.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 393）

SPIE, c1983

• pbk.

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA23970906
• ISBN:
  • 0892524286
• LCCN: 83061531
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: viii, 242 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC19 : 621.3815/2
• 件名:
  • LCSH : Lithography, Electron beam
  • LCSH : X-ray lithography
  • LCSH : Ion beam lithography
• 親書誌ID:
  • BA0022700X