Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California

Author(s)

• Thompson, L. F.
• International Society for Hybrid Microelectronics
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California

Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 539）

SPIE--the International Society for Optical Engineering, c1985

• pbk.

Note

Includes bibliographies and index

Details

• NCID: BA23998574
• ISBN:
  • 0892525746
• LCCN: 85050710
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: vi, 350 p.
• Size: 28 cm
• Classification:
  • LCC : TR940
  • DC19 : 686.2/325
• Subject Headings:
  • LCSH : Photoresists -- Congresses
• Parent Bibliography ID:
  • BA0022700X