Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California
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Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California
（Proceedings / SPIE -- the International Society for Optical Engineering, v. 632）
SPIE--the International Society for Optical Engineering, c1986
- pbk.
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Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V
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