Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California

著者

• Blais, Phillip D.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Electron-beam, x-ray & ion-beam techniques for submicrometer lithographies V : 11-12 March 1986, Santa Clara, California

Phillip D. Blais, chairman/editor

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 632）

SPIE--the International Society for Optical Engineering, c1986

• pbk.

タイトル別名

Electron-beam, x-ray, and ion-beam techniques for submicrometer lithographies V

注記

Includes bibliographies and index

詳細情報

• NII書誌ID(NCID): BA24022792
• ISBN:
  • 089252667X
• LCCN: 86061034
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 272 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC19 : 621.3815/2
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X