12th Annual Symposium on Photomask Technology and Management : 23-24 September 1992, Sunnyvale, California

著者

• Symposium on Photomask Technology and Management
• BACUS (Technical group)
• Society of Photo-optical Instrumentation Engineers

書誌事項

12th Annual Symposium on Photomask Technology and Management : 23-24 September 1992, Sunnyvale, California

sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1809）

SPIE, c1993

タイトル別名

Twelfth Annual Symposium on Photomask Technology and Management

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA26617870
• ISBN:
  • 0819410098
• LCCN: 92062651
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: ix, 286 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X