X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California
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X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California
(Proceedings / SPIE -- the International Society for Optical Engineering, v. 1343)
SPIE, c1991
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注記
"Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x
Includes bibliographical references and index