X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California

Author(s)

• Hoover, Richard B.
• Walker, A. B. C.
• Society of Photo-optical Instrumentation Engineers
• International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (1990 : San Diego, Calif.)

Bibliographic Information

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California

Richard B. Hoover, Arthur B.C. Walker, Jr. chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1343）

SPIE, c1991

Note

"Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x

Includes bibliographical references and index

Details

• NCID: BA26817698
• ISBN:
  • 0819404047
• LCCN: 90052838
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: xii, 579 p.
• Size: 28 cm
• Classification:
  • LCC : TA1775
  • DC20 : 621.36
• Subject Headings:
  • LCSH : X-ray optics -- Instruments -- Congresses
  • LCSH : Coatings -- Congresses
  • LCSH : Polarimetry -- Instruments -- Congresses
  • LCSH : X-ray lithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X