X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California

著者

• Hoover, Richard B.
• Walker, A. B. C.
• Society of Photo-optical Instrumentation Engineers
• International Symposium on Optical and Optoelectronic Applied Sciences and Engineering (1990 : San Diego, Calif.)

書誌事項

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography : 9-13 July 1990, San Diego, California

Richard B. Hoover, Arthur B.C. Walker, Jr. chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1343）

SPIE, c1991

注記

"Part of a three-conference program on X-Ray and EUV Technologies held at SPIE's International Symposium on Optical and Optoelectronic Applied Science and Engineering, 8-13 July 1990, in San Diego, California"--P. x

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA26817698
• ISBN:
  • 0819404047
• LCCN: 90052838
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: xii, 579 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TA1775
  • DC20 : 621.36
• 件名:
  • LCSH : X-ray optics -- Instruments -- Congresses
  • LCSH : Coatings -- Congresses
  • LCSH : Polarimetry -- Instruments -- Congresses
  • LCSH : X-ray lithography -- Congresses
• 親書誌ID:
  • BA0022700X