Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

著者

• Patterson, David O.
• Society of Photo-optical Instrumentation Engineers
• Semiconductor Equipment and Materials International

書誌事項

Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California

David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2194）

SPIE, c1994

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA27423508
• ISBN:
  • 0819414891
• LCCN: 94065789
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: ix, 420 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Masks (Electronics) -- Congresses
• 親書誌ID:
  • BA0022700X