14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

Author(s)

• Symposium on Photomask Technology and Management
• Brodsky, William L.
• Shelden, Gilbert V.
• BACUS (Technical group)

Bibliographic Information

14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

William L. Brodsky, Gilbert V. Sheldon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2322）

SPIE, c1994

Other Title

Fourteenth Annual Symposium on Photomask Technology and Management

Note

Includes bibliographical references and index

Details

• NCID: BA29175553
• ISBN:
  • 0819416533
• LCCN: 94067248
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: vii, 454 p.
• Size: 28 cm
• Classification:
  • LCC : TK7872.M3
  • DC20 : 621.3815/31
• Subject Headings:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X