14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

著者

• Symposium on Photomask Technology and Management
• Brodsky, William L.
• Shelden, Gilbert V.
• BACUS (Technical group)

書誌事項

14th annual Symposium on Photomask Technology and Management : proceedings : 14-16 September 1994, Santa Clara, California

William L. Brodsky, Gilbert V. Sheldon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 2322）

SPIE, c1994

タイトル別名

Fourteenth Annual Symposium on Photomask Technology and Management

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA29175553
• ISBN:
  • 0819416533
• LCCN: 94067248
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vii, 454 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7872.M3
  • DC20 : 621.3815/31
• 件名:
  • LCSH : Integrated circuits -- Masks -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0022700X