Process engineering analysis in semiconductor device fabrication

Bibliographic Information

Process engineering analysis in semiconductor device fabrication

Stanley Middleman, Arthur K. Hochberg

(McGraw-Hill chemical engineering series)

McGraw-Hill, c1993

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

Written primarily for chemical engineering students, the material included in this new text is an extension of upper level chemical engineering courses. Covering a range of processes in semiconductor device fabrication, the authors try to present traditional chemical engineering methodology in a non-traditional context. The text covers such topics as crystal growth and filtration and contains over 300 worked examples and problems.

Table of Contents

  • The physics of solids
  • device background
  • process modelling
  • the conservation equations
  • filtration of particles
  • particle deposition and removal
  • purity in process chemicals
  • silicon production
  • oxidation
  • microlithography
  • doping
  • etching
  • chemical vapour deposition
  • ion implantation
  • metalization.

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