Process engineering analysis in semiconductor device fabrication
著者
書誌事項
Process engineering analysis in semiconductor device fabrication
（McGraw-Hill chemical engineering series）
McGraw-Hill, c1993
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
Written primarily for chemical engineering students, the material included in this new text is an extension of upper level chemical engineering courses. Covering a range of processes in semiconductor device fabrication, the authors try to present traditional chemical engineering methodology in a non-traditional context. The text covers such topics as crystal growth and filtration and contains over 300 worked examples and problems.
目次
- The physics of solids
- device background
- process modelling
- the conservation equations
- filtration of particles
- particle deposition and removal
- purity in process chemicals
- silicon production
- oxidation
- microlithography
- doping
- etching
- chemical vapour deposition
- ion implantation
- metalization.
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