Introduction to microlithography

著者

• Thompson, L. F.
• Willson, C. G. (C. Grant)
• Bowden, M. J.

書誌事項

Introduction to microlithography

edited by Larry F. Thompson, C. Grant Willson, Murrae J. Bowden

（ACS professional reference book）

American Chemical Society, 1994

2nd ed

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Updated and expanded! Reviews the theory, materials, and processes that are used in the lithographic process. Opens with a brief historical introduction to the advances in microlithography. Discusses four major topics: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. Designed as a tutorial for researchers with no experience in the field, as well as those experienced in microlithography. Will also prove invaluable to those already involved in microlithography. Includes numerous references for more detailed reading on specific aspects of microlithography.

目次

• An Introduction to Lithography
• The Lithographic Process: The Physics
• Organic Resist Materials
• Resist Processing
• Plasma Etching

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA3402261X
• ISBN:
  • 0841228485
• LCCN: 93042023
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Washington, DC
• ページ数/冊数: xiv, 527 p.
• 大きさ: 24 cm
• 件名:
  • LCSH : Microlithography -- Congresses
  • LCSH : Photoresists -- Congresses
  • LCSH : Plasma etching -- Congresses
  • LCSH : Semiconductors -- Etching -- Congresses
• 親書誌ID:
  • BA04443415