Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

Author(s)

• Society of Photo-optical Instrumentation Engineers
• Conley, Will

Bibliographic Information

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineer

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3333）

SPIE, c1998

• SET
• pt. 1
• pt. 2

Note

Includes bibliographical references and index

Description and Table of Contents

Description

A review of advances in resist technology and processing. It contains 142 papers which cover areas such as ArF materials, DUV processing and Novolak-based processing.

by "Nielsen BookData"

Details

• NCID: BA37525151
• ISBN:
  • 0819427780
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: 2v.
• Size: 29 cm
• Parent Bibliography ID:
  • BA0022700X