Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

著者

• Society of Photo-optical Instrumentation Engineers
• Conley, Will

書誌事項

Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California

chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineer

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3333）

SPIE, c1998

• SET
• pt. 1
• pt. 2

注記

Includes bibliographical references and index

内容説明・目次

内容説明

A review of advances in resist technology and processing. It contains 142 papers which cover areas such as ArF materials, DUV processing and Novolak-based processing.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA37525151
• ISBN:
  • 0819427780
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: 2v.
• 大きさ: 29 cm
• 親書誌ID:
  • BA0022700X