Lithography process control

Author(s)

    • Levinson, Harry J.

Bibliographic Information

Lithography process control

Harry J. Levinson

(Tutorial texts in optical engineering, v. TT 28)

SPIE Optical Engineering Press, c1999

  • softcover

Available at  / 1 libraries

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Note

Includes bibliographical references (p. 169-188) and index

Description and Table of Contents

Description

This tutorial text covers lithography process control at several levels, from fundamental through advanced topics. A basic familiarity with lithography science is assumed. The book is intended to be a self contained tutorial that works as an introduction to those entering the field, and as a reference for the experienced lithography engineer.

Table of Contents

  • Introduction to the use of statistical process control in lithography
  • sampling
  • simple and complex processes
  • linewidth control
  • overlay
  • yield
  • process drift and automatic process control
  • metrology
  • control of operations.

by "Nielsen BookData"

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