Lithography process control
著者
書誌事項
Lithography process control
（Tutorial texts in optical engineering, v. TT 28）
SPIE Optical Engineering Press, c1999
- softcover
大学図書館所蔵 件 / 全1件
-
該当する所蔵館はありません
- すべての絞り込み条件を解除する
注記
Includes bibliographical references (p. 169-188) and index
内容説明・目次
内容説明
This tutorial text covers lithography process control at several levels, from fundamental through advanced topics. A basic familiarity with lithography science is assumed. The book is intended to be a self contained tutorial that works as an introduction to those entering the field, and as a reference for the experienced lithography engineer.
目次
- Introduction to the use of statistical process control in lithography
- sampling
- simple and complex processes
- linewidth control
- overlay
- yield
- process drift and automatic process control
- metrology
- control of operations.
「Nielsen BookData」 より
