Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

Author(s)

• Society of Photo-optical Instrumentation Engineers
• Conley, Will

Bibliographic Information

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3678）

SPIE, c1999

• : set
• pt. 1
• pt. 2

Other Title

Advances in resist technology and processing XVI : microlithography 1999 : 15-17 March 1999, Santa Clara, California

Note

Includes bibliographical references and index

Details

• NCID: BA45995999
• ISBN:
  • 0819431524
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: 2v.
• Size: 28 cm
• Parent Bibliography ID:
  • BA0022700X