Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

著者

• Society of Photo-optical Instrumentation Engineers
• Conley, Will

書誌事項

Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California

chair/editor Will Conley ; sponsored and published by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 3678）

SPIE, c1999

• : set
• pt. 1
• pt. 2

タイトル別名

Advances in resist technology and processing XVI : microlithography 1999 : 15-17 March 1999, Santa Clara, California

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA45995999
• ISBN:
  • 0819431524
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: 2v.
• 大きさ: 28 cm
• 親書誌ID:
  • BA0022700X