Bibliographic Information

Ferroelectric memories

J.F. Scott

(Advanced microelectronics, v. 3)

Springer, c2000

  • : hard
  • : pbk

Available at  / 22 libraries

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Note

Includes bibliographical references (p. [225]-243) and index

"With 170 figures" -- T.p.

Description and Table of Contents

Description

This is the first comprehensive book on ferroelectric memories which contains chapters on device design, processing, testing, and device physics, as well as on breakdown, leakage currents, switching mechanisms, and fatigue. State-of-the-art device designs are included and illustrated among the books many figures. More than 500 up-to-date references and 76 problems make it useful as a research reference for physicists, engineers and students.

Table of Contents

1. Introduction.- 2. Basic Properties of RAMs (Random Access Memories).- 3. Electrical Breakdown (DRAMs and NV-RAMs).- 4. Leakage Currents.- 5. Capacitance-Voltage Data: C(V).- 6. Switching Kinetics.- 7. Charge Injection and Fatigue.- 8. Frequency Dependence.- 9. Phase Sequences in Processing.- 10. SBT-Family Aurivillius-Phase Layer Structures.- 11. Deposition and Processing.- 12. Nondestructive Read-Out Devices.- 13. Ferroelectrics-on-Superconductor Devices: Phased-Array Radar and 10-100 GHz Devices.- 14. Wafer Bonding.- 15. Electron-Emission and Flat-Panel Displays.- 16. Optical Devices.- 17. Nanophase Devices.- 18. Drawbacks and Disadvantages.- A. Exercises.

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Details

  • NCID
    BA47296298
  • ISBN
    • 3540663878
    • 9783642085659
  • LCCN
    99056368
  • Country Code
    gw
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Berlin
  • Pages/Volumes
    xvi, 248 p.
  • Size
    25 cm
  • Classification
  • Subject Headings
  • Parent Bibliography ID
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