2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA

著者

• International Conference on Simulation of Semiconductor Devices and Processes
• IEEE Electron Devices Society

書誌事項

2000 International Conference on Simulation of Semiconductor Processes and Devices : SISPAD 2000, September 6-8, 2000, Seattle, Washington, USA

sponsored by IEEE Electron Devices Society

Institute of Electrical and electronics Engineers, c2000

• :softbound

タイトル別名

SISPAD 2000

00TH8502

注記

"IEEE catalog number 00TH8502"--T.p. verso

Includes bibliographical references and index

内容説明・目次

内容説明

The proceedings of the International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), 2000. Topics include: device simulation; quantum effects and novel devices; process simulation; lithography simulation; user interfaces and visualization; calibration; and more.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA51053110
• ISBN:
  • 0780362799
• LCCN: 00000282
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: [New York]
• ページ数/冊数: ix, 282 p.
• 大きさ: 28 cm