2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA

著者

• International Symposium on Plasma Process-Induced Damage
• Engelhardt, Manfred
• Hook, Terence
• Gabriel, Calvin T.
• IEEE Electron Devices Society
• American Vacuum Society
• 応用物理学会 オウヨウ ブツリ ガッカイ

書誌事項

2001 6th International Symposium on Plasma- and Process-Induced Damage, May 13-15, 2001, Monterey, California, USA

Manfred Engelhardt, Terence Hook, and Calvin T. Gabriel, ; technical co-sponsors, American Vacuum Society, IEEE/Electron Devices Society, Japanese Society of Applied Physics

American Vacuum Society - Northen California Chapter, c2001

• : soft.

タイトル別名

01TH8538

注記

"P2ID"-- on cover

"IEEE Catalog Number (softbound) 01TH8583" -- T. p. verso

Includes bibliographical references and index

内容説明・目次

内容説明

This work covers topics such as: damage measurement; plasma characterization and damage mitigation; non-volatile memories; ultra-thin dielectrics; contamination; and multi-terminal effects.

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA52793939
• ISBN:
  • 096515775X
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Santa Clara, Calif.
• ページ数/冊数: i, 128 p.
• 大きさ: 28 cm
• 件名:
  • LCSH : Semiconductor wafers -- Defects -- Congresses
  • LCSH : Semiconductors -- Effect of radiation on -- Congresses
  • LCSH : Plasma etching -- Congresses