Applications to nonthermal plasma processing

書誌事項

Applications to nonthermal plasma processing

J. Reece Roth

(Industrial plasma engineering / J. Reece Roth, v. 2)

Institute of Physics Pub., c2001

  • : hbk
  • : pbk

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注記

Includes bibliographical references and index

内容説明・目次

巻冊次

: hbk ISBN 9780750305440

内容説明

Written by a leading expert in the field, Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.

目次

Surface Interactions in Plasma Processing. Atmospheric Pressure Plasma Sources. Vacuum Plasma Sources. Plasma Reactors for Plasma Processing. Specialized Techniques and Devices for Plasma Processing. Parametric Plasma Effects on Plasma Processing. Diagnostics for Plasma Processing. Plasma Treatment of Surfaces. Surface Modification by Implantation and Diffusion. Thin Film Deposition by Evaporative Condensation and Sputtering. Plasma Chemical Vapor Deposition (PCVD). Plasma Etching.
巻冊次

: pbk ISBN 9780750305457

内容説明

Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.

目次

Surface Interactions in Plasma Processing. Atmospheric Pressure Plasma Sources. Vacuum Plasma Sources. Plasma Reactors for Plasma Processing. Specialized Techniques and Devices for Plasma Processing. Parametric Plasma Effects on Plasma Processing. Diagnostics for Plasma Processing. Plasma Treatment of Surfaces. Surface Modification by Implantation and Diffusion. Thin Film Deposition by Evaporative Condensation and Sputtering. Plasma Chemical Vapor Deposition (PCVD). Plasma Etching.

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関連文献: 1件中  1-1を表示

  • Industrial plasma engineering

    J. Reece Roth

    Institute of Physics Pub. c1995-2001

    v. 1 : Principles , : pbk. : v.1 : Principles

    所蔵館35館

詳細情報

  • NII書誌ID(NCID)
    BA53715566
  • ISBN
    • 0750305444
    • 0750305452
  • 出版国コード
    uk
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Bristol ; Philadelphia
  • ページ数/冊数
    xi, 645 p.
  • 大きさ
    24 cm
  • 分類
  • 件名
  • 親書誌ID
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