Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium
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Copper Interconnects, New Contact Metallurgies/Structures, and Low-K Interlevel Dielectrics : proceedings of the International Symposium
（Proceedings / [Electrochemical Society], v. 2000-27,
Electrochemical Society, c2001-2003
- [I]
- II
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注記
[I]:"The symposium, cosponsored by Dielectric Science & Technology, Electronics, and Electrodeposition Divisions, was held as part of the 198th meeting of The Electrochemical Society, Inc. in Phoenix, AZ, October 22-27, 2000"--on pref.
II:"..., was held as part of the 204th meeting of The Electrochemical Society, Inc. in Orlando, FL, October 12-17, 2003"--on pref
Includes bibliographical references and indexes
