Advances in plasma-grown hydrogenated films

著者

• Francombe, Maurice H.

書誌事項

Advances in plasma-grown hydrogenated films

edited by Maurice H. Francombe

（Thin films and nanostructures, v. 30）

Academic Press, c2002

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats

目次

Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon-Nitrogen Films

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA5479466X
• ISBN:
  • 0125330308
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: San Diego ; Tokyo
• ページ数/冊数: x, 280 p.
• 大きさ: 24 cm
• 親書誌ID:
  • BA54794568