Chemical vapor deposition : Fourth International Conference

Author(s)

Bibliographic Information

Chemical vapor deposition : Fourth International Conference

edited by Gene F. Wakefield, John M. Blocher

Electrothermics and Metallurgy Division, Electrochemical Society, c1973

Available at  / 4 libraries

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Note

***記述は遡及データによる

Details

  • NCID
    BA55974215
  • LCCN
    73086873
  • Country Code
    us
  • Title Language Code
    eng
  • Text Language Code
    eng
  • Place of Publication
    Princeton
  • Pages/Volumes
    xi, 595 p.
  • Size
    23 cm
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